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Updated
November 2006

FUV FILTERS


Each of the five UVI filters are comprised of three reflective and one transmissive element. Each element is a dielectric multilayer stack. The design of the filters results in a significant reduction of the visible light passing through while maintaining a high throughput for the wavelengths of interest. The wavelengths short of the region of interest are primarily absorbed by the materials in the dielectric stack and/or the transmissive element. The wavelengths long of the region of interest are primarily absorbed by the substrate on the reflective elements. For more information on the filter design, refer to the following paper:

  • Muamer Zukic, Douglas G. Torr, Jongmin Kim, James F. Spann, and Marsha R. Torr, Filters for the International Solar Terrestrial Physics Mission far-ultraviolet imager, Opt. Eng., 32, 3069, 1993.

A significant effort was put forth in evaluating materials to be used in the filters. Selection of materials is difficult in the wavelength region from 115 nm to 200 nm because of the limited number of materials which have are transmitting (small extinction coefficient). Of those materials that are transmitting, many are susceptible to radiation effects and become less transparent when exposed. We conducted tests to determine which materials are suitable for a radiation environment and provide a proper high or low index of refraction required for the multilayer design. For more information on the materials, refer the following three papers:

  • M. Zukic, D. G. Torr, J. F. Spann, and M. R. Torr, Vacuum Ultraviolet Thin Films, Part I Optical Constants of BaF2, CaF2, LaF3, MgF2, Al2O2, HfO2, and SiO2, Appl. Opt., 29, 28, 4284, 1990.
  • M. Zukic, D. G. Torr, J. F. Spann, and M. R. Torr, Vacuum Ultraviolet Thin Films, Part II Vacuum Ultraviolet All-Dielectric Narrowband Filters, Appl. Opt., 29, 28, 4293, 1990.
  • Charles E. Keffer, Marsha R. Torr, Muamer Zukic, James F. Spann, Douglas G. Torr, and Jongmin Kim, Radiation Damage Effects in Far Ultraviolet Filters and Substrates, Appl. Opt., 33, 6041, 1994.

The pioneering effort of the filter design was headed by Dr. Muamer Zukic while at the Center for Applied Optics at the University of Alabama in Huntsville. He is currently a Research Scientist at Jaycor, Huntsville, AL, phone: (256) 837-9100. The development of the filters was a joint effort between the University of Alabama in Huntsville and the Marshall Space Flight Center. The key individuals in this effort were Dr. M. Zukic, Dr. J. F. Spann, Dr. Kim, and Dr. Charles Keffer.

Photographs


Filter Performance

Because of the unique design of the UVI filters, the required bandwidth and peak throughput is achieved. The filter's performance allows the separation of various auroral emissions for the first time using a 2 dimensional imager. The analysis of various images taken with the filters allows for quantitative assessment of the total energy flux into the auroral regions and the characteristic energy. The peak wavelength and bandwidth of each filter is listed below.
 
Filter Peak Wavelength Bandwidth (includes response of CsI photocathode) Throughput Plot (filter elements only)
ALL

- - -

- - -
Summary Plot
1304 130.4 nm 40 nm FWHM 1304 filter plot
1356 135.6 nm 50 nm FWHM 1356 filter plot
LBH short 150.0 nm 141 - 158 nm (10% of peak) LBH short filter plot
LBH long 170.0 nm 164 - 178 nm (10% of peak) LBH long filter plot
Solar 180.0 nm 176 - 190 nm (10% of peak) Solar filter plot



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